Files
LabDataStorageEvaluation/out/config/lab_config.yaml
administrator af91629f71 feat(config): update .gitignore to exclude output artifacts and add config files
- ignore all output files except for reports and config directories
- add new .done files for tasks 01-11 to track completion status
- include new configuration files for hardware prices and lab setup
- generate process flow and report documents for tasks 02 and 11
2026-07-11 23:52:28 -04:00

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YAML

# Generated by make_lab_config.py (task 01) from docs/specs/01_lab_configuration.md.
# Do not hand-edit: regenerate via `python make_lab_config.py`.
project: LabDataStorageEvaluation
description: Simulated tribology laboratory (Sandia Pt-Au LDRD context)
spec: docs/specs/01_lab_configuration.md
seed: 20260711
material_system:
substrate:
material: Ti-6Al-4V
dimensions_mm:
- 10
- 10
- 3
adhesion_layer:
material: Cr
process: sputtered
coating:
material: Pt-Au
deposition: composition gradient across each wafer
thickness_um_range:
- 0.3
- 1.1
instruments:
- instrument_id: rapid
role: friction
name: RAPID custom high-throughput parallelized 6-probe tribometer
data_produced: COF vs cycle per track; test conditions
- instrument_id: ti980
role: nanoindentation
name: Bruker TI980 TriboIndenter
data_produced: hardness, reduced modulus (25 indents per coupon)
- instrument_id: m4_tornado
role: composition
name: Bruker M4 Tornado micro-XRF
data_produced: Pt/Au wt% map per coupon (20x20 grid)
- instrument_id: pvd200
role: deposition
name: Kurt J. Lesker PVD 200 sputter-down
data_produced: batch deposition parameters
- instrument_id: afm
role: surface_roughness
name: AFM
data_produced: topography image metadata + Ra/Rq per coupon
- instrument_id: profilometer
role: film_thickness
name: Optical profilometry
data_produced: thickness map per coupon (10x10 grid)
- instrument_id: simtra
role: simulation
name: SIMTRA sputter transport Monte-Carlo
data_produced: deposition atom-energy / composition profiles per deposition run
deposition_matrix:
- batch_code: B721
pt_gun_tilt_deg: 20
au_gun_tilt_deg: 0
pt_power_W: 150
au_power_W: 50
pt_discharge_V: 432
au_discharge_V: 311
- batch_code: B722
pt_gun_tilt_deg: 20
au_gun_tilt_deg: 20
pt_power_W: 100
au_power_W: 100
pt_discharge_V: 399
au_discharge_V: 352
- batch_code: B723
pt_gun_tilt_deg: 20
au_gun_tilt_deg: 20
pt_power_W: 150
au_power_W: 50
pt_discharge_V: 430
au_discharge_V: 311
- batch_code: B724
pt_gun_tilt_deg: 0
au_gun_tilt_deg: 20
pt_power_W: 50
au_power_W: 150
pt_discharge_V: 376
au_discharge_V: 340
hierarchy:
batches: 4
wafers_per_batch: 3
coupon_grid_per_wafer:
- 7
- 7
coupons_per_wafer: 49
friction_assignment:
friction_coupons_total: 480
reserve_coupons_total: 108
runs: 4
coupons_per_run: 120
plates_per_run: 5
probes_per_plate: 6
coupons_per_probe_square: 4
tracks_per_friction_coupon: 3
counterfaces_per_holder: 3
fresh_counterface_per_track: true
reserve_grid_positions:
- 1
- 4
- 7
- 22
- 25
- 28
- 43
- 46
- 49
volumes:
coupons_total: 588
tracks_total: 1440
cycles_per_track: 1000
cycle_rows_total: 1440000
loop_every_n_cycles: 100
loops_per_track: 10
loop_points_per_loop: 200
loop_points_total: 2880000
xrf_grid:
- 20
- 20
xrf_points_per_coupon: 400
xrf_points_total: 235200
profilometry_grid:
- 10
- 10
profilometry_points_per_coupon: 100
nanoindentation_indents_per_coupon: 25
simtra_rows_per_batch: 1000
runs:
- run_code: R1
batch_code: B721
environment: lab_air
date: '2026-04-06'
operator: A. Reyes
- run_code: R2
batch_code: B722
environment: lab_air
date: '2026-04-13'
operator: K. Patel
- run_code: R3
batch_code: B723
environment: dry_n2
date: '2026-04-20'
operator: A. Reyes
- run_code: R4
batch_code: B724
environment: dry_n2
date: '2026-04-27'
operator: M. Novak
schedule:
deposition_start_date: '2026-03-02'
batch_interval_days: 7
characterization_lag_days: 3
run_start_time: 09:00:00
track_interval_s: 2100
test_conditions:
normal_load_mN: 100
stroke_mm: 1.0
speed_mm_s: 1.0
counterface:
material: ruby (Al2O3)
diameter_mm: 3.175
rh_pct:
lab_air: 45
dry_n2: 2
temperature_C: 23
temperature_tolerance_C: 1
physical_models:
au_gradient:
description: linear Au wt% gradient along wafer x, batch-dependent center
batch_center_wtpct:
B721: 8
B722: 25
B723: 10
B724: 60
wafer_span_wtpct: 5
xrf_noise_sd_wtpct: 0.3
cof_run_in:
formula: cof(c) = cof_ss + (cof_0 - cof_ss) * exp(-c / tau) + N(0, sigma)
cof_0_range:
- 0.35
- 0.5
tau_cycles_range:
- 100
- 400
noise_sd: 0.01
cof_steady_state:
formula: cof_ss = intercept + slope_per_au_wtpct * au_wtpct_mean, clamped to >= floor
lab_air:
intercept: 0.32
slope_per_au_wtpct: -0.0015
dry_n2:
intercept: 0.24
slope_per_au_wtpct: -0.0012
floor: 0.12
hardness_GPa:
formula: H = intercept + slope_per_au_wtpct * au_wtpct_mean + N(0, noise_sd)
intercept: 8.5
slope_per_au_wtpct: -0.05
noise_sd: 0.25
reduced_modulus_GPa:
formula: Er = intercept + slope_per_au_wtpct * au_wtpct_mean + N(0, noise_sd)
intercept: 190
slope_per_au_wtpct: -0.6
noise_sd: 4
roughness_ra_nm:
distribution: lognormal
median_nm: 5
sigma_log: 0.3
rq_over_ra: 1.25
thickness_um:
profile: radial parabolic across wafer plus noise
center_um: 1.05
edge_um: 0.35
noise_sd_um: 0.02
range_um:
- 0.3
- 1.1
wear_archard:
formula: V = k * F * s; k = k0 * (1 + slope_per_au_wtpct * au_wtpct_mean), lognormal noise, clamped
to >= k_floor
k0_mm3_per_N_m:
lab_air: 1.5e-07
dry_n2: 6.0e-08
slope_per_au_wtpct:
lab_air: -0.008
dry_n2: -0.01
k_floor_mm3_per_N_m: 1.0e-09
noise_sigma_log: 0.15
friction_loop:
force_noise_sd_mN: 0.3
nanoindentation:
max_load_mN: 10
indent_grid:
- 5
- 5
grid_pitch_um: 20
simtra:
angle_deg_range:
- 0
- 90
energy_eV_max: 50
surface_binding_energy_eV:
pt: 5.84
au: 3.81
flux_per_W: 0.02