# Generated by make_lab_config.py (task 01) from docs/specs/01_lab_configuration.md. # Do not hand-edit: regenerate via `python make_lab_config.py`. project: LabDataStorageEvaluation description: Simulated tribology laboratory (Sandia Pt-Au LDRD context) spec: docs/specs/01_lab_configuration.md seed: 20260711 material_system: substrate: material: Ti-6Al-4V dimensions_mm: - 10 - 10 - 3 adhesion_layer: material: Cr process: sputtered coating: material: Pt-Au deposition: composition gradient across each wafer thickness_um_range: - 0.3 - 1.1 instruments: - instrument_id: rapid role: friction name: RAPID custom high-throughput parallelized 6-probe tribometer data_produced: COF vs cycle per track; test conditions - instrument_id: ti980 role: nanoindentation name: Bruker TI980 TriboIndenter data_produced: hardness, reduced modulus (25 indents per coupon) - instrument_id: m4_tornado role: composition name: Bruker M4 Tornado micro-XRF data_produced: Pt/Au wt% map per coupon (20x20 grid) - instrument_id: pvd200 role: deposition name: Kurt J. Lesker PVD 200 sputter-down data_produced: batch deposition parameters - instrument_id: afm role: surface_roughness name: AFM data_produced: topography image metadata + Ra/Rq per coupon - instrument_id: profilometer role: film_thickness name: Optical profilometry data_produced: thickness map per coupon (10x10 grid) - instrument_id: simtra role: simulation name: SIMTRA sputter transport Monte-Carlo data_produced: deposition atom-energy / composition profiles per deposition run deposition_matrix: - batch_code: B721 pt_gun_tilt_deg: 20 au_gun_tilt_deg: 0 pt_power_W: 150 au_power_W: 50 pt_discharge_V: 432 au_discharge_V: 311 - batch_code: B722 pt_gun_tilt_deg: 20 au_gun_tilt_deg: 20 pt_power_W: 100 au_power_W: 100 pt_discharge_V: 399 au_discharge_V: 352 - batch_code: B723 pt_gun_tilt_deg: 20 au_gun_tilt_deg: 20 pt_power_W: 150 au_power_W: 50 pt_discharge_V: 430 au_discharge_V: 311 - batch_code: B724 pt_gun_tilt_deg: 0 au_gun_tilt_deg: 20 pt_power_W: 50 au_power_W: 150 pt_discharge_V: 376 au_discharge_V: 340 hierarchy: batches: 4 wafers_per_batch: 3 coupon_grid_per_wafer: - 7 - 7 coupons_per_wafer: 49 friction_assignment: friction_coupons_total: 480 reserve_coupons_total: 108 runs: 4 coupons_per_run: 120 plates_per_run: 5 probes_per_plate: 6 coupons_per_probe_square: 4 tracks_per_friction_coupon: 3 counterfaces_per_holder: 3 fresh_counterface_per_track: true reserve_grid_positions: - 1 - 4 - 7 - 22 - 25 - 28 - 43 - 46 - 49 volumes: coupons_total: 588 tracks_total: 1440 cycles_per_track: 1000 cycle_rows_total: 1440000 loop_every_n_cycles: 100 loops_per_track: 10 loop_points_per_loop: 200 loop_points_total: 2880000 xrf_grid: - 20 - 20 xrf_points_per_coupon: 400 xrf_points_total: 235200 profilometry_grid: - 10 - 10 profilometry_points_per_coupon: 100 nanoindentation_indents_per_coupon: 25 simtra_rows_per_batch: 1000 runs: - run_code: R1 batch_code: B721 environment: lab_air date: '2026-04-06' operator: A. Reyes - run_code: R2 batch_code: B722 environment: lab_air date: '2026-04-13' operator: K. Patel - run_code: R3 batch_code: B723 environment: dry_n2 date: '2026-04-20' operator: A. Reyes - run_code: R4 batch_code: B724 environment: dry_n2 date: '2026-04-27' operator: M. Novak schedule: deposition_start_date: '2026-03-02' batch_interval_days: 7 characterization_lag_days: 3 run_start_time: 09:00:00 track_interval_s: 2100 test_conditions: normal_load_mN: 100 stroke_mm: 1.0 speed_mm_s: 1.0 counterface: material: ruby (Al2O3) diameter_mm: 3.175 rh_pct: lab_air: 45 dry_n2: 2 temperature_C: 23 temperature_tolerance_C: 1 physical_models: au_gradient: description: linear Au wt% gradient along wafer x, batch-dependent center batch_center_wtpct: B721: 8 B722: 25 B723: 10 B724: 60 wafer_span_wtpct: 5 xrf_noise_sd_wtpct: 0.3 cof_run_in: formula: cof(c) = cof_ss + (cof_0 - cof_ss) * exp(-c / tau) + N(0, sigma) cof_0_range: - 0.35 - 0.5 tau_cycles_range: - 100 - 400 noise_sd: 0.01 cof_steady_state: formula: cof_ss = intercept + slope_per_au_wtpct * au_wtpct_mean, clamped to >= floor lab_air: intercept: 0.32 slope_per_au_wtpct: -0.0015 dry_n2: intercept: 0.24 slope_per_au_wtpct: -0.0012 floor: 0.12 hardness_GPa: formula: H = intercept + slope_per_au_wtpct * au_wtpct_mean + N(0, noise_sd) intercept: 8.5 slope_per_au_wtpct: -0.05 noise_sd: 0.25 reduced_modulus_GPa: formula: Er = intercept + slope_per_au_wtpct * au_wtpct_mean + N(0, noise_sd) intercept: 190 slope_per_au_wtpct: -0.6 noise_sd: 4 roughness_ra_nm: distribution: lognormal median_nm: 5 sigma_log: 0.3 rq_over_ra: 1.25 thickness_um: profile: radial parabolic across wafer plus noise center_um: 1.05 edge_um: 0.35 noise_sd_um: 0.02 range_um: - 0.3 - 1.1 wear_archard: formula: V = k * F * s; k = k0 * (1 + slope_per_au_wtpct * au_wtpct_mean), lognormal noise, clamped to >= k_floor k0_mm3_per_N_m: lab_air: 1.5e-07 dry_n2: 6.0e-08 slope_per_au_wtpct: lab_air: -0.008 dry_n2: -0.01 k_floor_mm3_per_N_m: 1.0e-09 noise_sigma_log: 0.15 friction_loop: force_noise_sd_mN: 0.3 nanoindentation: max_load_mN: 10 indent_grid: - 5 - 5 grid_pitch_um: 20 simtra: angle_deg_range: - 0 - 90 energy_eV_max: 50 surface_binding_energy_eV: pt: 5.84 au: 3.81 flux_per_W: 0.02