- ignore all output files except for reports and config directories - add new .done files for tasks 01-11 to track completion status - include new configuration files for hardware prices and lab setup - generate process flow and report documents for tasks 02 and 11
4.1 KiB
4.1 KiB
Process Flow - Simulated Tribology Laboratory
Generated by make_process_flow.py (task 02) from out/config/lab_config.yaml. Standalone diagram sources: ./diagrams/D1..D6.mermaid.
D1 - Coupon Assembly
Substrate preparation, adhesion layer, and gradient Pt-Au sputter deposition.
flowchart LR
A([Ti-6Al-4V Base 10x10x3 mm]) --> B[Cleaning]
B --> B1([Rinsed in deionized water])
B1 --> B2([Sonicated in cleaning solution])
B --> C[Smearing Adhesive]
C --> C1([Cr adhesive coating])
C --> D[Vapor Deposition System<br/>Kurt J. Lesker PVD 200]
D --> D1([PtAu sputter coating, gradient])
D --> E([Test Coupon])
D2 - Characterization and Batch Assembly
Per-coupon simulation and thickness characterization, then assembly into wafers (x49 coupons) and batches (x3 wafers), deposited per the parameter table below.
flowchart LR
TC([Test Coupon]) --> S[SIMTRA simulation<br/>composition / atom energies]
S --> OP[Optical profilometry<br/>film thickness 0.3-1.1 um]
OP --> TW[Assemble Test Wafer<br/>x49 coupons]
TW --> TB[Assemble Test Batch<br/>x3 wafers]
TB --> B721[B721<br/>Pt 150 W / Au 50 W]
TB --> B722[B722<br/>Pt 100 W / Au 100 W]
TB --> B723[B723<br/>Pt 150 W / Au 50 W]
TB --> B724[B724<br/>Pt 50 W / Au 150 W]
Deposition matrix:
| Batch | Pt:Au gun tilt | Pt power W | Au power W | Pt discharge V | Au discharge V |
|---|---|---|---|---|---|
| B721 | 20:0 deg | 150 | 50 | 432 | 311 |
| B722 | 20:20 deg | 100 | 100 | 399 | 352 |
| B723 | 20:20 deg | 150 | 50 | 430 | 311 |
| B724 | 0:20 deg | 50 | 150 | 376 | 340 |
D3 - Testing Tree
The four characterization/testing paths every coupon can take.
flowchart TD
TC([Test Coupon]) --> F[Friction<br/>RAPID 6-probe tribometer]
F --> FA([Lab Air -> COF dataset mu_normal])
F --> FN([Dry N2 -> COF dataset mu_dry_nit])
TC --> NI[Nanoindentation<br/>Bruker TI980]
NI --> NIR([Hardness, reduced modulus<br/>25 indents per coupon])
TC --> AF[AFM]
AF --> AFR([Topography -> Ra / Rq])
TC --> XR[micro-XRF<br/>Bruker M4 Tornado]
XR --> XRR([Pt/Au wt% map, 20x20 grid])
D4 - Tribometer Session Sequence
Operator workflow for one RAPID tribometer session, from test request to teardown.
sequenceDiagram
actor Op as Operator
participant Prep as Sample Prep
participant Plan as Excel Test Plan
participant SW as Control Software
participant TR as RAPID Tribometer
Op->>Prep: Request test
Op->>Prep: Get samples
Op->>Prep: Load samples onto plates
Op->>Prep: Load ball holders (3 counterfaces per holder)
Op->>Plan: Create test plan<br/>(Sample Plate, Plate Location, Sample ID, Save Location,<br/>Folder Name, X/Y/Z Offset, Load, Iterations)
Op->>TR: Transfer plates to tribometer
Op->>TR: Set up platter
Op->>SW: Activate software
Op->>SW: Load plan
SW->>TR: Activate tribometer
TR-->>SW: Run reciprocating tests (execution loop, see D5)
Op->>SW: Software stop
SW-->>Op: Save avg files
Op->>TR: Remove plates and platters
Op->>SW: Close software
Op->>TR: Pull equipment out
D5 - Execution Loop
Nested iteration executed by the tribometer within one run.
flowchart TD
L[Load all counterfaces] --> P{5 plates}
P -->|for each plate| PR{6 probes in parallel}
PR -->|for each probe| C{4 coupons on coupon square}
C -->|for each coupon| T[Draw track]
T --> RC[Rotate counterface - fresh ball per track]
RC -->|3 tracks per coupon| T
T --> DONE([120 coupons x 3 tracks = 360 tracks per run])
D6 - Data Hierarchy
Entity containment and per-entity measurement datasets (ERD-style).
erDiagram
DEPOSITION_RUN ||--|| SIMTRA_PROFILE : produces
DEPOSITION_RUN ||--|| BATCH : creates
BATCH ||--|{ WAFER : contains
WAFER ||--|{ COUPON : contains
COUPON ||--|| XRF_MAP : has
COUPON ||--|| NANOINDENTATION : has
COUPON ||--|| AFM : has
COUPON ||--|| PROFILOMETRY : has
COUPON ||--o{ TRACK : "friction coupons only"
TRACK ||--|{ CYCLE : has
TRACK ||--|{ LOOP_POINT : has
TRACK ||--|| WEAR : has